Samsung Plans High-NA EUV Production Use From 2028 - report

Samsung Electronics Co., Ltd. (005930) plans to use ASML high-NA EUV tools in mass production from 2028, Aju Business Daily reported Tuesday. The outlet cited Bloomberg.

High numerical aperture extreme ultraviolet equipment focuses light at wider angles than existing EUV systems. The technology can print finer semiconductor circuits on wafers. TSMC plans mass-production use from 2030, according to the same report.

The report identified Samsung and TSMC as buyers of ASML's next-generation equipment. It did not state Samsung's planned tool count or purchase value. The company's market capitalisation was ₩1,575.6 trillion at Tuesday's close.

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